Kanagawa, Japan

Takahito Kido

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Canon Kabushiki Kaisha. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takahito Kido. Retrieved from https://idiyas.com/inventor/takahito-kido

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: The Innovations of Takahito Kido

Introduction

Takahito Kido is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of liquid ejection technology. With a total of 2 patents, Kido's work has advanced the capabilities of printing and liquid ejection systems.

Latest Patents

Kido's latest patents include a "Liquid ejection head and liquid ejection apparatus." This invention focuses on suppressing the deterioration of printing quality by utilizing reference members positioned strategically to enhance performance. Another notable patent is the "Liquid ejection head and recording apparatus," which features a base substrate with a flow passage for liquid, chips designed to eject the liquid, and a cover member that surrounds the chips. This design incorporates a sealing resin to address gaps between the chips and the cover member, ensuring a more efficient operation.

Career Highlights

Takahito Kido is associated with Canon Kabushiki Kaisha, a leading company in imaging and printing technology. His work at Canon has allowed him to explore innovative solutions that improve the functionality and reliability of liquid ejection systems.

Conclusion

Takahito Kido's contributions to liquid ejection technology exemplify the spirit of innovation in the field. His patents reflect a commitment to enhancing printing quality and efficiency. Through his work, Kido continues to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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