Takahisa Nakashima

Title: The Innovations of Takahisa Nakashima

Introduction

Takahisa Nakashima is a notable inventor based in Karatsu, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of silicon wafer processing. With a total of 2 patents to his name, Nakashima continues to push the boundaries of innovation.

Latest Patents

Nakashima's latest patents include an alkali etching liquid for silicon wafers and an etching method utilizing this solution. The alkali etching liquid comprises an aqueous solution of potassium hydroxide, combined with diethylene triamine pentaacetic acid in concentrations ranging from 0.1 g/L to 0.5 g/L. Additionally, the iron concentration in the potassium hydroxide solution is maintained at no more than 50 ppb. The etching method involves etching a silicon wafer with a resistivity of no more than 1 Ω·cm using this specialized etching liquid.

Career Highlights

Nakashima is currently employed at Sumco Corporation, where he applies his expertise in semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and effectiveness of silicon wafer processing techniques.

Collaborations

Throughout his career, Nakashima has collaborated with esteemed colleagues such as Makoto Takemura and Yasuyuki Hashimoto. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Takahisa Nakashima's contributions to the field of semiconductor technology are noteworthy. His innovative patents and collaborative efforts continue to shape the future of silicon wafer processing.