Fujinomiya, Japan

Takahiro Sakamoto

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Fujifilm Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takahiro Sakamoto. Retrieved from https://idiyas.com/inventor/takahiro-sakamoto-xtzls1t6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2018

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Takahiro Sakamoto: Coating Application Innovation

Introduction

Takahiro Sakamoto is an inventor associated with Fujifilm Corporation in Fujinomiya, Japan. His patent work addresses the evenness of coating surfaces when applying liquid to a continuously moving web.

Latest Patents

Sakamoto is named on 1 patent: “Applicator and Application Method.” The invention describes an applicator with a rotating bar that contacts the upper surface of a travelling web through coating liquid. An upstream barrier plate guides the liquid toward the web between the plate and the bar. The specified distances between the barrier plate, bar, and web are designed to help improve the evenness of the coating surface.

Career Highlights

Sakamoto’s listed patent reflects work on coating equipment and application methods. The invention sets out dimensional relationships for the applicator, including distances of 0.5 to 5 millimeters and the condition that the distance from the barrier plate to the web does not exceed the distance from the plate to the bar.

Collaborations

Sakamoto’s listed coworkers include Akifumi Kato and Takanori Sato. The patent information provided identifies the invention and its technical approach but does not specify the coworkers’ roles in its development.

Conclusion

Takahiro Sakamoto’s patent focuses on improving coating uniformity through the design and positioning of an applicator bar and barrier plate.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…