Osaka, Japan

Takahiro Mishima

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2001

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Takahiro Mishima

Introduction

Takahiro Mishima is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of wafer production technology. His innovative approach has led to advancements that enhance efficiency and quality in the manufacturing process.

Latest Patents

Mishima holds a patent for a "Method and apparatus for producing a wafer." This invention involves a method and apparatus for cutting a wafer from a crystalline ingot by directing a stream or streams of etching gas at the crystalline ingot in a vacuum. This technique greatly minimizes waste during the cutting process and maintains a clean work environment. Additionally, it allows for excellent surface smoothness on the cut wafers. He has 1 patent to his name.

Career Highlights

Mishima is currently employed at Daido Hoxan Inc., where he continues to develop and refine his innovative technologies. His work has been instrumental in improving the efficiency of wafer production, which is crucial for various applications in the semiconductor industry.

Collaborations

Mishima collaborates with talented individuals such as Takashi Yokoyama and Kazuma Yamamoto. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.

Conclusion

Takahiro Mishima's contributions to wafer production technology exemplify the impact of innovation in the manufacturing sector. His patented methods not only improve efficiency but also ensure high-quality outcomes in wafer production.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…