Tokyo, Japan

Takahiro Kameda

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ricoh Company, Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takahiro Kameda. Retrieved from https://idiyas.com/inventor/takahiro-kameda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Takahiro Kameda: Innovator in Image Processing Technology

Introduction

Takahiro Kameda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of image processing, particularly through his innovative patent that enhances the management of manuscript data.

Latest Patents

Kameda holds a patent for an "Image processing system, management system, image processing apparatus and method of proofreading document." This invention provides a management system for overseeing a manuscript of a book through multiple steps. The system includes a print control unit that generates data for printing sheets in response to print requests. The manuscript data is digitized, and each sheet contains unique identification information to ensure the properness of the respective sheets.

Career Highlights

Kameda is associated with Ricoh Company, Ltd., where he applies his expertise in image processing technology. His work focuses on improving the efficiency and accuracy of document management systems.

Collaborations

Some of Kameda's coworkers include Atsushi Kimura and Tomoyuki Tazuke, who contribute to the innovative projects at Ricoh Company, Ltd.

Conclusion

Takahiro Kameda's work in image processing technology exemplifies the impact of innovation in document management systems. His contributions continue to shape the future of this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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