Company Filing History:
Years Active: 2009
Title: Takahiro Hibino: Innovator in Extreme Ultraviolet Light Sources
Introduction
Takahiro Hibino is a prominent inventor based in Suita, Japan. He is known for his significant contributions to the field of extreme ultraviolet (EUV) light sources. His innovative work focuses on enhancing the efficiency of EUV light emission, which has important applications in various technologies, including semiconductor manufacturing.
Latest Patents
Hibino holds a patent for an extreme ultraviolet light source and its target. The objective of this invention is to provide a target that emits extreme ultraviolet light with high emission efficiency. The patent describes a solid target made of heavy metal or heavy-metal compound, with a density ranging from 0.5 to 80% of the crystal density. When irradiated with a laser beam, the target generates plasma from the heavy metal, emitting extreme ultraviolet light at a predetermined wavelength. This innovative approach allows for better control of plasma density and improves emission efficiency, thereby reducing energy loss.
Career Highlights
Takahiro Hibino is affiliated with Osaka University, where he conducts research and development in the field of extreme ultraviolet technology. His work has garnered attention for its potential to advance the efficiency of light sources used in various industrial applications.
Collaborations
Hibino collaborates with notable colleagues, including Keiji Nagai and Hiroaki Nishimura. Their combined expertise contributes to the advancement of research in extreme ultraviolet light sources.
Conclusion
Takahiro Hibino's innovative work in extreme ultraviolet light sources exemplifies the importance of research and development in enhancing technological efficiency. His contributions are paving the way for advancements in various industries that rely on high-performance light sources.