Kakegawa, Japan

Takahide Suzuki

This inventor holds 1 USPTO granted patent. Top assignee: Merck Patent Gmbh. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takahide Suzuki. Retrieved from https://idiyas.com/inventor/takahide-suzuki-uoa3y65z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Takahide Suzuki: Innovator in Fine Pattern Manufacturing

Introduction

Takahide Suzuki is a prominent inventor based in Kakegawa, Japan. He has made significant contributions to the field of manufacturing, particularly in the development of methods for creating fine patterns. His innovative approach has led to advancements in display device technology.

Latest Patents

Takahide Suzuki holds a patent for a "Method of manufacturing fine pattern and method of manufacturing display device using the same." This patent outlines a novel method for producing fine patterns, which is crucial for enhancing the quality and functionality of display devices. He has 1 patent to his name.

Career Highlights

Currently, Takahide Suzuki is employed at Merck Patent GmbH, where he continues to work on innovative solutions in manufacturing. His expertise in fine pattern technology has positioned him as a key player in the industry.

Collaborations

Throughout his career, Takahide has collaborated with notable colleagues, including Hirokazu Ikeda and Toshiaki Nonaka. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Takahide Suzuki's contributions to the field of manufacturing, particularly in fine pattern technology, highlight his role as an influential inventor. His work continues to impact the development of advanced display devices, showcasing the importance of innovation in this sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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