Chigasaki, Japan

Takahide Murayama

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Takahide Murayama: Innovator in Plasma Processing Technology

Introduction

Takahide Murayama is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing device that enhances various industrial applications.

Latest Patents

Takahide Murayama holds 1 patent for his invention of a plasma processing device. This device features a chamber, a flat-plate-shaped first electrode, and a first high-frequency power supply. Additionally, it includes a helical second electrode positioned outside the chamber, facing the first electrode with a quartz plate forming the upper lid of the chamber. The device is equipped with a gas introducing unit, where a second high-frequency power supply and a third high-frequency power supply are connected to the second electrode. The second high-frequency power supply applies an AC voltage of a second frequency, while the third high-frequency power supply applies an AC voltage of a third frequency, which is higher than the second frequency. This configuration allows for the simultaneous application of two types of AC voltages.

Career Highlights

Takahide Murayama is currently employed at Ulvac, Inc., a company known for its advanced technology in vacuum and plasma processing systems. His work at Ulvac has positioned him as a key player in the development of innovative solutions in the industry.

Collaborations

Throughout his career, Takahide has collaborated with notable colleagues, including Yasuhiro Morikawa and Toshiyuki Sakuishi. These collaborations have contributed to the advancement of technology in plasma processing.

Conclusion

Takahide Murayama's contributions to plasma processing technology exemplify his innovative spirit and dedication to advancing industrial applications. His patent for the plasma processing device showcases his expertise and commitment to enhancing technology in this field.

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