This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Corporation. Active years: 1983.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1983
Title: Takaharu Shima: Innovator in Electron Beam Technology
Introduction
Takaharu Shima is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of electron beam technology, particularly through his innovative methods for exposing electron beams.
Latest Patents
One of his key patents is titled "Method for exposing an electron beam." This invention discloses a method for shaping an electron beam into a polygon of desired size by passing it through a first and a second aperture. The invention addresses the issue of positional deviation of the apertures due to heat, which can affect the electron beam's accuracy. By detecting the current passing through the second aperture, the offset value of the real image formed can be automatically determined. This allows for corrections during electron-beam exposure for patterning, ensuring precision in the process.
Career Highlights
Takaharu Shima is associated with Fujitsu Corporation, where he has been able to apply his expertise in electron beam technology. His work has contributed to advancements in various applications, enhancing the capabilities of electron beam systems.
Collaborations
He has collaborated with notable colleagues such as Yuji Akazawa and Toshihiko Osada, further enriching the innovative environment at Fujitsu Corporation.
Conclusion
Takaharu Shima's contributions to electron beam technology exemplify the impact of innovative thinking in engineering. His patent on the method for exposing an electron beam showcases his commitment to precision and advancement in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile