Kanagawa, Japan

Takaai Kuroiwa

This inventor holds 1 USPTO granted patent. Top assignee: Yamatake-Honeywell Co., Ltd.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takaai Kuroiwa. Retrieved from https://idiyas.com/inventor/takaai-kuroiwa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1990

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Takaai Kuroiwa: Innovator in Moisture-Sensitive Technology

Introduction

Takaai Kuroiwa is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of moisture-sensitive technology. His innovative work has led to the development of a unique moisture-sensitive element that has practical applications in humidity detection.

Latest Patents

Kuroiwa holds 1 patent for his invention of a moisture-sensitive element. This element consists of a moisture-sensitive film made from a polymer that is prepared by polymerizing a methacrylate monomer that does not contain a hydroxyl group. Additionally, he has disclosed a humidity detector that utilizes this moisture-sensitive element, showcasing its practical applications in various industries.

Career Highlights

Kuroiwa is currently employed at Yamatake-Honeywell Co., Ltd., where he continues to innovate and develop new technologies. His work at this company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of Kuroiwa's coworkers include Yoshiro Sakai and Yoshihiko Sadaoka. Their collaborative efforts contribute to the advancement of technology in moisture-sensitive applications.

Conclusion

Takaai Kuroiwa's contributions to moisture-sensitive technology highlight his role as an innovator in this field. His patent and ongoing work at Yamatake-Honeywell Co., Ltd. demonstrate his commitment to advancing technology for practical use.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…