Tokyo, Japan

Taisuke Suzuki

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Japan Oxygen, Co., Ltd.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taisuke Suzuki. Retrieved from https://idiyas.com/inventor/taisuke-suzuki-5mcqt3i5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Taisuke Suzuki: Innovator in Adsorptive Separation Processes

Introduction

Taisuke Suzuki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of adsorptive separation processes. His innovative work has led to the development of a patented technology that enhances efficiency in various applications.

Latest Patents

Taisuke Suzuki holds a patent for an adsorptive separation process. This invention is designed to improve the separation of gases and liquids, making it a valuable asset in industrial applications. His patent showcases his expertise and commitment to advancing technology in this area. He has 1 patent to his name.

Career Highlights

Taisuke Suzuki is currently employed at Japan Oxygen Co., Ltd. His role at the company allows him to apply his innovative ideas and contribute to the development of cutting-edge technologies. His work has garnered attention within the industry, highlighting his skills as an inventor.

Collaborations

Taisuke has collaborated with notable colleagues, including Hidetake Okada and Masato Kawai. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Taisuke Suzuki is a dedicated inventor whose work in adsorptive separation processes has made a significant impact in his field. His contributions continue to influence advancements in technology, showcasing his talent and commitment to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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