Taisuke Suwa

Title: Taisuke Suwa: Innovator in Imaging Technology

Introduction

Taisuke Suwa is a prominent inventor based in Auderghem, Belgium. He has made significant contributions to the field of imaging technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of imaging devices.

Latest Patents

One of Taisuke Suwa's latest patents is titled "Capacitance matched metal wirings in dual conversion gain pixels." This patent describes an imaging device that includes a pixel with a photoelectric conversion region, multiple transfer transistors, and floating diffusions designed to control access to the charge storage areas. The device features a first wiring layer that connects various floating diffusions and is capacitively coupled to enhance performance.

Another notable patent is "Imaging devices with gated time-of-flight pixels with fast charge transfer." This invention involves a pixel array where each pixel contains a photoelectric conversion region and a charge transfer section. The design includes transfer transistors that facilitate efficient charge transfer, improving the overall functionality of the imaging device.

Career Highlights

Taisuke Suwa is currently employed at Sony Semiconductor Solutions Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing imaging solutions that are widely used in various applications.

Collaborations

Throughout his career, Taisuke has collaborated with talented individuals such as Adarsh Basavalingappa and Michiel Timmermans. These collaborations have contributed to the development of cutting-edge technologies in imaging.

Conclusion

Taisuke Suwa is a key figure in the realm of imaging technology, with a focus on enhancing device performance through innovative patents. His contributions continue to shape the future of imaging solutions.