Tosu, Japan

Taisei Motomura

This inventor holds 1 USPTO granted patent. Top assignee: National Institute of Advanced Industrial Science and Technology. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taisei Motomura. Retrieved from https://idiyas.com/inventor/taisei-motomura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Taisei Motomura: Innovator in Plasma Technology

Introduction

Taisei Motomura is a notable inventor based in Tosu, Japan. He has made significant contributions to the field of plasma technology, particularly with his innovative designs that enhance efficiency in various applications.

Latest Patents

Motomura holds a patent for a "Plasma source, and atomic clock employing plasma source." This invention features a small plasma source that enables highly efficient discharge in an ultra-high vacuum state. The design includes multiple magnets arranged strategically to optimize performance, along with electrodes that facilitate the discharge process. His patent is a testament to his expertise and innovative thinking in the field.

Career Highlights

Motomura is affiliated with the National Institute of Advanced Industrial Science and Technology, where he continues to push the boundaries of plasma technology. His work has garnered attention for its potential applications in various scientific and industrial fields.

Collaborations

He has collaborated with esteemed colleagues such as Yuuichi Kurashima and Shinya Yanagimachi, contributing to advancements in their shared field of research.

Conclusion

Taisei Motomura's contributions to plasma technology exemplify the spirit of innovation. His work not only enhances scientific understanding but also paves the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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