Location History:
- Minami-ashigara, JA (1977)
- Tokyo, JP (1980)
- Fujinomiya, JP (1981)
Company Filing History:
Years Active: 1977-1981
Title: The Innovations of Taiichi Nishimura
Introduction
Taiichi Nishimura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of photographic materials, holding a total of three patents. His work has been instrumental in advancing technologies related to photographic sensitive materials.
Latest Patents
Nishimura's latest patents include innovative developments such as "Photographic polyolefin coated paper bases with ionomer layer." This patent describes a base for photographic sensitive material that incorporates a layer of an ionomer of an alpha-olefin and an alpha, beta-ethylenically unsaturated carboxylic acid between the surface of the paper and the polyolefin coating. Another significant patent is for a "Recording element," which comprises a support and microcapsules that contain a specific color-former and a triarylmethane type hydrocarbon compound as a solvent.
Career Highlights
Nishimura has had a distinguished career at Fuji Photo Film Company, Limited, where he has been able to apply his innovative ideas and technical expertise. His work has contributed to the development of advanced photographic products that enhance image quality and durability.
Collaborations
Throughout his career, Nishimura has collaborated with talented individuals such as Yoshimasa Asanuma and Masato Satomura. These collaborations have fostered a creative environment that has led to the successful development of new technologies in the photographic industry.
Conclusion
Taiichi Nishimura's contributions to the field of photography through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations in photographic materials.