Taiga Ogose

Title: Taiga Ogose: Innovator in Reflective Mask Technology

Introduction

Taiga Ogose is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of reflective mask technology, particularly in the context of EUV lithography. With a total of 3 patents to his name, Ogose continues to push the boundaries of innovation in this specialized area.

Latest Patents

Ogose's latest patents include the "Reflective Mask Blank" and "Reflective Mask." The reflective mask blank features a substrate with a multilayer reflection film that reflects exposure light. This film has a periodically laminated structure, alternating between low refractive index layers and high refractive index layers. Notably, at least one of the low refractive index layers consists of a two-layered structure containing molybdenum and an additive element selected from nitrogen, carbon, boron, silicon, and hydrogen. The second patent focuses on a reflective mask blank designed for EUV lithography, which includes a substrate, a multilayer reflection film, a protection film, and an absorber film. The low-refractive index layer in this patent is composed of multiple sublayers with varying compositions.

Career Highlights

Taiga Ogose is currently employed at Shin-Etsu Chemical Co., Ltd., where he applies his expertise in reflective mask technology. His work has been instrumental in advancing the capabilities of EUV lithography, which is crucial for the production of advanced semiconductor devices.

Collaborations

Ogose collaborates with notable colleagues such as Takuro Kosaka and Yukio Inazuki. Their combined efforts contribute to the innovative projects at Shin-Etsu Chemical Co., Ltd.

Conclusion

Taiga Ogose is a key figure in the field of reflective mask technology, with a focus on EUV lithography. His patents and collaborations highlight his commitment to innovation and excellence in this critical area of research.