Ayase, Japan

Taiga Kondo

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Tosoh Corporation, Tosoh Speciality Materials Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taiga Kondo. Retrieved from https://idiyas.com/inventor/taiga-kondo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Taiga Kondo

Introduction

Taiga Kondo is a notable inventor based in Ayase, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets. His innovative work has led to advancements in the production of high-quality sputtering films.

Latest Patents

Kondo holds a patent for a sputtering target, which includes crystal grains and has a content of an amorphous phase of 3% by volume or less. This patent also specifies that the target contains at least one metal selected from the group consisting of chromium, molybdenum, and chromium-molybdenum alloys. His patent is a testament to his expertise and dedication to improving sputtering technology. He has 1 patent to his name.

Career Highlights

Throughout his career, Taiga Kondo has worked with prominent companies such as Tosoh Corporation and Tosoh Specialty Materials Corporation. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Kondo has collaborated with talented individuals in his field, including Daiki Shono and Masami Mesuda. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Taiga Kondo's contributions to the field of materials science, particularly through his patent for sputtering targets, highlight his innovative spirit and commitment to advancing technology. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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