Tokyo, Japan

Tai Ohuchi

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Tai Ohuchi in Chemical Production

Introduction

Tai Ohuchi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical production, particularly through his innovative methods. His work has led to advancements in the synthesis of important chemical compounds.

Latest Patents

Tai Ohuchi holds a patent for a production method for indan and hydrindane. This method involves a reaction step where a raw material composition, including tetrahydroindene, is introduced into a continuous reactor. The reactor contains a solid catalyst made of platinum, and the raw material composition is brought into contact with this catalyst under specific conditions ranging from 150° C. to 350° C. The resulting reaction product includes indan and hydrindane, with precise ratios of hydrogen and oxygen molecules to tetrahydroindene.

Career Highlights

Tai Ohuchi is currently employed at Eneos Corporation, where he continues to develop innovative chemical processes. His expertise in the field has been recognized through his patent, which showcases his ability to enhance production methods in the chemical industry.

Collaborations

Tai collaborates with esteemed colleagues, including Yasuhiro Araki and Atsushi Segawa. Their combined efforts contribute to the advancement of chemical production techniques and foster a collaborative environment for innovation.

Conclusion

Tai Ohuchi's contributions to the field of chemical production through his patented methods exemplify the importance of innovation in the industry. His work not only enhances production efficiency but also paves the way for future advancements in chemical synthesis.

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