Gyeongsan, South Korea

Taewon Park

This inventor holds 1 USPTO granted patent. Top assignee: Sl Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taewon Park. Retrieved from https://idiyas.com/inventor/taewon-park-e0xfv0a8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Taewon Park: Innovator in Charging Technology

Introduction

Taewon Park is a notable inventor based in Gyeongsan-si, South Korea. He has made significant contributions to the field of charging technology, particularly with his innovative designs that enhance user experience and functionality.

Latest Patents

Taewon Park holds a patent for a "Charge Port Door." This invention features a door panel that opens and closes a charging housing accommodating a charging port. The design includes an optical unit within the door panel that irradiates light to the exterior. A controller manages the optical unit based on specific conditions, such as the open/closed status of the door panel, charging status, driving state, detection of a driver, or motion of an external object. This patent showcases his commitment to improving charging solutions.

Career Highlights

Taewon Park is currently employed at SL Corporation, where he continues to develop innovative technologies. His work at the company reflects his dedication to advancing the field of electrical engineering and design.

Collaborations

He collaborates with talented coworkers, including Daehee Kwak and Mansoo Heo, who contribute to the innovative environment at SL Corporation.

Conclusion

Taewon Park's contributions to charging technology through his patent and work at SL Corporation highlight his role as an influential inventor in the industry. His innovative spirit continues to drive advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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