This inventor holds 2 USPTO granted patents. Top assignee: Lg Display Co., Ltd.. Active years: 2019-2020.
Company Filing History:
Years Active: 2019-2020
Title: Taeuk Park - Innovator in Thin-Film Transistor Technology
Introduction
Taeuk Park is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of thin-film transistors, holding a total of 2 patents. His work focuses on enhancing the performance and efficiency of electronic devices through innovative semiconductor technologies.
Latest Patents
Taeuk Park's latest patents include advancements in thin-film transistor array substrates. One exemplary embodiment of his invention comprises an active layer, an intermediate layer, a gate insulating film, a gate electrode, an interlayer insulating film, and source and drain electrodes. The active layer is positioned on a substrate, with the gate insulating film placed on top. The gate electrode is situated on the gate insulating film, while the interlayer insulating film is positioned above the gate electrode. The source and drain electrodes are connected to the active layer and are located on the interlayer insulating film. The intermediate layer, made of an oxide semiconductor containing a Group IV element, is positioned between the active layer and the gate insulating film.
Career Highlights
Taeuk Park is currently employed at LG Display Co., Ltd., where he continues to innovate in the field of display technologies. His expertise in thin-film transistors has positioned him as a key contributor to advancements in electronic displays.
Collaborations
Taeuk Park has collaborated with talented coworkers such as Saeroonter Oh and Juheyuck Baeck. Their combined efforts have led to significant developments in the field of semiconductor technology.
Conclusion
Taeuk Park is a distinguished inventor whose work in thin-film transistors has the potential to impact the future of electronic devices. His contributions to the field are noteworthy, and his ongoing research promises to yield further innovations.
