This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Taemin Park - Innovator in Substrate Processing Technology
Introduction
Taemin Park is an inventor based in Suwon-si, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach focuses on improving the efficiency and effectiveness of cleaning processes in substrate processing apparatuses.
Latest Patent Applications
Taemin Park's notable patent application is titled "COVER WAFER AND METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME." This application describes a method of cleaning a substrate processing apparatus that provides a processing space for accommodating a process wafer. The method includes disposing a cover wafer on the upper surface of the substrate support, fixing the cover wafer to the substrate support using the internal electrode, plasma cleaning the processing space, and subsequently removing the cover wafer. The cover wafer is made of silicon carbide (SiC), and its design aims to enhance the cleaning process by ensuring that the average roughness of its upper surface is less than that of the process wafer.
Conclusion
Taemin Park's work in substrate processing technology showcases his innovative spirit and dedication to advancing the field. His patent application reflects a thoughtful approach to improving cleaning methods in processing apparatuses.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile