Suwon, South Korea

Taemin Earmme

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taemin Earmme. Retrieved from https://idiyas.com/inventor/taemin-earmme-ffpnm9hm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Taemin Earmme - Innovator in Substrate Processing Technology

Introduction

Taemin Earmme is an inventor based in Suwon-si, South Korea. He is known for his contributions to substrate processing technology. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

One of Taemin Earmme's latest patent applications is for a substrate processing apparatus. This apparatus includes a chamber with a support portion for supporting a substrate in its internal space. It features an opening on one side of the chamber, a window portion at the opening, and a laser irradiation device that directs a laser beam to the substrate through the window. The window portion consists of a first window and a second window, which are spaced apart by a gap.

Another significant application is for a method of manufacturing a semiconductor device. This method involves forming a first gate structure on a first region of a substrate, followed by the creation of a bit line structure on the first gate structure. It also includes forming a preliminary contact plug layer made of amorphous silicon on the substrate, and a reflective layer structure on the preliminary contact plug layer. The method further details the formation of a contact plug layer from the preliminary contact plug layer and a capacitor on the contact plug layer. Notably, the reflective layer structure comprises first and second reflective layers, with the second reflective layer having a greater refractive index than the first. Portions of the second reflective layer may vary in thickness across the substrate's first and second regions. The process of forming the contact plug layer may involve a melting laser annealing (MLA) process to convert the amorphous silicon into polysilicon.

Conclusion

Taemin Earmme is an innovative inventor whose work in substrate processing technology shows great promise. His latest patent applications reflect his commitment to advancing semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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