Kaizuka, Japan

Taeko Hata

This inventor holds 1 USPTO granted patent. Top assignee: Santen Pharmaceutical Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taeko Hata. Retrieved from https://idiyas.com/inventor/taeko-hata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Taeko Hata: Innovator in Pain Management

Introduction

Taeko Hata is a notable inventor based in Kaizuka, Japan. She has made significant contributions to the field of pain management through her innovative research and development. Her work focuses on creating effective solutions to inhibit the decrease in pain threshold, which is crucial for improving patient care.

Latest Patents

Taeko Hata holds 1 patent for her invention titled "Inhibitor of Pain Threshold Decrease." This invention aims to provide a drug that effectively inhibits a decrease in pain threshold. The use of a κ-opioid receptor agonist is central to her invention, making it a valuable tool in pain management.

Career Highlights

Hata is associated with Santen Pharmaceutical Co., Ltd., where she continues to advance her research in pharmacology. Her dedication to improving pain management therapies has positioned her as a key figure in her field.

Collaborations

Throughout her career, Taeko Hata has collaborated with esteemed colleagues such as Kyoichi Shimomura and Hiroyuki Aono. These partnerships have enhanced her research and contributed to the development of innovative solutions in pain management.

Conclusion

Taeko Hata's contributions to the field of pain management through her innovative inventions highlight her importance as an inventor. Her work continues to impact the lives of many individuals suffering from pain-related conditions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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