Taek-Min Lee

Title: Taek-Min Lee: Innovator in Nano Patterning Technology

Introduction

Taek-Min Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of nano patterning technology, holding 2 patents that showcase his innovative approach to printing technology.

Latest Patents

One of his latest patents is a printing head for nano patterning. This invention includes a manifold for accommodating a liquid printing material, a cartridge with an injection chamber communicating with the manifold, and a sample holder for patterning installed outside the injection chamber of the cartridge. The printing head features a shadow mask that can be finely moved in an X-Y direction and has a single injection hole of relatively very small size. It also includes an actuator for finely moving the shadow mask, an injection-inducing unit with a high voltage generator, and a control unit for managing the actuator's movements. This innovative design improves patterning accuracy, enables ultra-fine patterning, and simplifies the configuration for injecting the printing material.

Career Highlights

Taek-Min Lee is affiliated with the Korea Institute of Machinery and Materials, where he continues to advance his research and development in the field of nano patterning. His work has garnered attention for its potential applications in various industries, including electronics and materials science.

Collaborations

He has collaborated with notable colleagues such as Dong-Soo Kim and Byung-Oh Choi, contributing to a dynamic research environment that fosters innovation and technological advancement.

Conclusion

Taek-Min Lee's contributions to nano patterning technology exemplify the spirit of innovation in modern engineering. His patents reflect a commitment to enhancing precision in manufacturing processes, paving the way for future advancements in the field.