Yongin, South Korea

Taejin Hwang

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Display Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taejin Hwang. Retrieved from https://idiyas.com/inventor/taejin-hwang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Taejin Hwang

Introduction

Taejin Hwang is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of display technology. His work focuses on enhancing the functionality and efficiency of display devices.

Latest Patents

Taejin Hwang holds a patent for a display device and method of inspecting the same. This innovative display device features a substrate that is bendable about a bending line. It includes a display element layer positioned above the substrate, a protection film located below the substrate, and a separator that corresponds to the bending line.

Career Highlights

Hwang is currently employed at Samsung Display Co., Ltd., a leading company in the display technology sector. His role involves developing advanced display solutions that cater to modern consumer needs. His expertise in this area has contributed to the company's reputation for innovation.

Collaborations

Hwang collaborates with fellow inventor Hyeongmin Ahn, working together to push the boundaries of display technology. Their combined efforts aim to create cutting-edge solutions that enhance user experience.

Conclusion

Taejin Hwang's contributions to display technology exemplify the spirit of innovation. His patent and work at Samsung Display Co., Ltd. highlight his commitment to advancing the field. His collaboration with Hyeongmin Ahn further emphasizes the importance of teamwork in achieving technological breakthroughs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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