Company Filing History:
Years Active: 2021
Title: Innovations of Taegeun Kim in Photolithography
Introduction
Taegeun Kim is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of photolithography through his innovative work on water-soluble diacetylene monomers. His research focuses on developing compositions that enhance the efficiency and effectiveness of micropattern formation.
Latest Patents
Taegeun Kim holds a patent for a novel water-soluble diacetylene, which is a photolithography composition comprising a water-soluble diacetylene monomer and a conductive polymer. The patent describes a method for preparing fine patterns using this composition. The water-soluble diacetylene monomer does not aggregate when mixed with a water-soluble conductive polymer, allowing for the creation of a uniform composition. This composition can be formed into a thin film and selectively crosslinked through photopolymerization, resulting in insoluble negative-type micropatterns.
Career Highlights
Taegeun Kim is associated with the Industry-University Cooperation Foundation at Hanyang University. His work has been instrumental in advancing the field of photolithography, particularly in the development of materials that improve the quality of micropatterns.
Collaborations
Taegeun Kim has collaborated with notable colleagues, including Jongman Kim and Chanwoo Lee. Their combined efforts have contributed to the success of various research projects and innovations in the field.
Conclusion
Taegeun Kim's innovative work in photolithography, particularly with water-soluble diacetylene monomers, showcases his commitment to advancing technology in this area. His contributions are paving the way for more efficient and effective methods of micropattern formation.