Seoul, South Korea

Tae-Min Earmme

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tae-Min Earmme. Retrieved from https://idiyas.com/inventor/tae-min-earmme-sm09fewu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Tae-Min Earmme: Innovator in Link Structures

Introduction

Tae-Min Earmme is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of engineering, particularly in the development of innovative link structures. His work is characterized by a focus on functionality and efficiency.

Latest Patents

Tae-Min Earmme holds a patent for a unique link structure. This invention includes a first link, a second link connected to the first, and a third link also connected to the first. The design features a first rotary shaft and a second rotary shaft, each with corresponding actuators that allow for rotation. This innovative approach enhances the versatility and application of link structures in various technologies. He has 1 patent to his name.

Career Highlights

Earmme is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of engineering and design. His work at Samsung has allowed him to collaborate with some of the brightest minds in the industry.

Collaborations

Some of his notable coworkers include Sun-Ho Kim and Ki-Hoon Nam. Their collective expertise contributes to the innovative environment at Samsung Electronics.

Conclusion

Tae-Min Earmme is a distinguished inventor whose work in link structures exemplifies innovation in engineering. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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