Seoul, South Korea

Tae Jwa Park

This inventor holds 1 USPTO granted patent. Top assignee: Caremedi Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tae Jwa Park. Retrieved from https://idiyas.com/inventor/tae-jwa-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 3.0

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Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Tae Jwa Park: Innovator in Electrochemical Monitoring Technology

Introduction

Tae Jwa Park is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of electrochemical technology, particularly in monitoring flow rates. His innovative approach has led to the development of a unique apparatus that enhances the accuracy of flow measurements.

Latest Patents

Tae Jwa Park holds a patent for an "Electrochemical apparatus for monitoring flow rate." This invention includes a membrane with a designated space for containing an ionic fluid, along with electrodes that facilitate the measurement of flow rates through ionic current. The control unit of the apparatus is designed to apply voltage to the electrodes, enabling the calculation of flow rates based on the ionic current generated by the fluid.

Career Highlights

Tae Jwa Park is currently associated with Caremedi Co., Ltd., where he continues to innovate in the field of electrochemical devices. His work has garnered attention for its practical applications in various industries, enhancing the efficiency and reliability of flow monitoring systems.

Collaborations

Some of his notable coworkers include Woon Sup Shin and Enhua Zhu, who have collaborated with him on various projects within the company.

Conclusion

Tae Jwa Park's contributions to electrochemical monitoring technology exemplify the impact of innovative thinking in engineering. His patent and ongoing work at Caremedi Co., Ltd. highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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