Daejeon, South Korea

Tae-Jun Park

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Korea Institute of Geoscience and Mineral Resources. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tae-Jun Park. Retrieved from https://idiyas.com/inventor/tae-jun-park-963h01uy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Tae-Jun Park: Innovator in Max and MXene Technologies

Introduction

Tae-Jun Park is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of Max and MXene technologies. His innovative approach focuses on utilizing low-cost materials to enhance the efficiency and accessibility of advanced materials.

Latest Patents

Tae-Jun Park holds a patent for "Max and MXene using vanadium carbide and method for manufacturing same." This patent presents a method for creating Max and MXene using low-cost vanadium carbide instead of the more expensive vanadium metal. This innovation not only reduces production costs but also opens new avenues for the application of these materials in various industries.

Career Highlights

Tae-Jun Park is affiliated with the Korea Institute of Geoscience and Mineral Resources, where he conducts research and development in advanced materials. His work has garnered attention for its practical applications and potential impact on the field of geoscience and mineral resources.

Collaborations

Some of his notable coworkers include Ki-Min Roh and Han-Jung Kwon, who collaborate with him on various research projects. Their combined expertise contributes to the advancement of innovative technologies in their field.

Conclusion

Tae-Jun Park is a key figure in the development of cost-effective materials for Max and MXene technologies. His contributions are paving the way for future innovations in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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