This inventor holds 1 USPTO granted patent. Top assignee: Samsung Semiconductor and Telecommunications Co.. Active years: 1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1992
Title: The Innovative Contributions of Tae-Hyuk Ahn in Semiconductor Technology
Introduction
Tae-Hyuk Ahn is a notable inventor based in Taegu, South Korea, recognized for his contributions to semiconductor technology. With a unique approach to fabricating semiconductor devices, he has developed innovative methods that address common issues in the manufacturing process, particularly residue management. His expertise is evident through his patent, which highlights a significant advancement in the field.
Latest Patents
Tae-Hyuk Ahn holds a patent titled "Method for Fabricating a Semiconductor Device by Slope Etching." This invention offers a novel approach to manufacturing semiconductor devices, ensuring that residues do not accumulate around the etching patterns of poly-silicon. The method involves gradient etching of poly-silicon, where an oxide barrier layer is deposited over the poly-silicon layer, followed by the implantation of impurities. The concentration difference of these impurities enables the creation of graded sidewalls in the poly-silicon, allowing for controlled resistance based on the amount of impurities used. This innovative technique ultimately leads to the selective etching of a poly electrode with a graded sidewall, enhancing the efficiency and effectiveness of semiconductor devices.
Career Highlights
Tae-Hyuk Ahn is currently associated with Samsung Semiconductor and Telecommunications Co., one of the leading firms in the semiconductor industry. His work at Samsung has positioned him at the forefront of technological advancements, where he continues to refine and develop methods that support the future of semiconductor manufacturing.
Collaborations
In his journey, Tae-Hyuk Ahn has collaborated with esteemed colleagues Jung-In Hong and Byung-Deok Yoo, further enriching his work in the field of semiconductor technology. These collaborations have fostered an environment of innovation, allowing for the sharing of ideas and expertise that contribute to significant advancements in their respective projects.
Conclusion
Tae-Hyuk Ahn exemplifies the spirit of innovation within the semiconductor industry. His patented method for fabricating semiconductor devices not only addresses critical manufacturing challenges but also showcases his dedication to enhancing technology. As he continues his work at Samsung Semiconductor and Telecommunications Co., the contributions of Tae-Hyuk Ahn are likely to resonate within the industry for years to come.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile