Daegu, South Korea

Tae-Hyuk Ahn

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Semiconductor and Telecommunications Co.. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tae-Hyuk Ahn. Retrieved from https://idiyas.com/inventor/tae-hyuk-ahn-lebzn5f2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Tae-Hyuk Ahn in Semiconductor Technology

Introduction

Tae-Hyuk Ahn is a notable inventor based in Taegu, South Korea, recognized for his contributions to semiconductor technology. With a unique approach to fabricating semiconductor devices, he has developed innovative methods that address common issues in the manufacturing process, particularly residue management. His expertise is evident through his patent, which highlights a significant advancement in the field.

Latest Patents

Tae-Hyuk Ahn holds a patent titled "Method for Fabricating a Semiconductor Device by Slope Etching." This invention offers a novel approach to manufacturing semiconductor devices, ensuring that residues do not accumulate around the etching patterns of poly-silicon. The method involves gradient etching of poly-silicon, where an oxide barrier layer is deposited over the poly-silicon layer, followed by the implantation of impurities. The concentration difference of these impurities enables the creation of graded sidewalls in the poly-silicon, allowing for controlled resistance based on the amount of impurities used. This innovative technique ultimately leads to the selective etching of a poly electrode with a graded sidewall, enhancing the efficiency and effectiveness of semiconductor devices.

Career Highlights

Tae-Hyuk Ahn is currently associated with Samsung Semiconductor and Telecommunications Co., one of the leading firms in the semiconductor industry. His work at Samsung has positioned him at the forefront of technological advancements, where he continues to refine and develop methods that support the future of semiconductor manufacturing.

Collaborations

In his journey, Tae-Hyuk Ahn has collaborated with esteemed colleagues Jung-In Hong and Byung-Deok Yoo, further enriching his work in the field of semiconductor technology. These collaborations have fostered an environment of innovation, allowing for the sharing of ideas and expertise that contribute to significant advancements in their respective projects.

Conclusion

Tae-Hyuk Ahn exemplifies the spirit of innovation within the semiconductor industry. His patented method for fabricating semiconductor devices not only addresses critical manufacturing challenges but also showcases his dedication to enhancing technology. As he continues his work at Samsung Semiconductor and Telecommunications Co., the contributions of Tae-Hyuk Ahn are likely to resonate within the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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