Tae Hwan Youn

Title: Tae Hwan Youn: Innovator in Substrate Processing Technology

Introduction

Tae Hwan Youn is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing, holding two patents that showcase his innovative approach to technology.

Latest Patents

His latest patents include a substrate processing apparatus and a substrate processing method. The first patent provides an apparatus for treating a substrate, which features a chuck that supports the substrate, a gas supply unit for delivering process gas to the substrate's edge region, and an edge electrode designed to generate plasma from the gas. The edge electrode is uniquely shaped with a ring and a groove that enhances its functionality. The second patent also focuses on substrate processing, detailing an apparatus that includes a housing with a process space, a gas supply unit, and a support unit with a chuck and lower electrode. This innovative design aims to improve the efficiency and effectiveness of substrate processing.

Career Highlights

Tae Hwan Youn has established himself as a key figure in his field through his inventive work at Psk Inc. His contributions have not only advanced technology but have also set new standards in substrate processing.

Collaborations

He has collaborated with notable coworkers, including Geon Jong Kim and Jong Chan Lee, who have contributed to his projects and innovations.

Conclusion

Tae Hwan Youn's work in substrate processing technology exemplifies his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate treatment, positioning him as a leader in his field.