Hwaseong-si, South Korea

Tae Ho Ham

This inventor holds 1 USPTO granted patent. Top assignee: Wonik Ips Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tae Ho Ham. Retrieved from https://idiyas.com/inventor/tae-ho-ham-l3iv37xo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Tae Ho Ham - Innovator in Substrate Processing Technology

Introduction

Tae Ho Ham is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique substrate processing apparatus.

Latest Patents

Tae Ho Ham holds a patent for a substrate processing apparatus. This apparatus is designed to perform substrate processing on multiple substrates within a process chamber that defines several processing spaces. The invention includes a process chamber with N processing spaces, N gas injection units corresponding to each processing space, and N substrate supports that face the gas injection units. Additionally, it features a transfer support for substrate handling and a rotation support that allows substrates to rotate about a vertical axis.

Career Highlights

Tae Ho Ham is associated with Wonik Ips Co., Ltd., where he continues to advance his research and development efforts. His work in substrate processing has positioned him as a key figure in the industry.

Collaborations

Tae Ho Ham has collaborated with notable colleagues, including Kwang Ha Choi and Cheol Woo Lee. Their combined expertise contributes to the innovative projects at Wonik Ips Co., Ltd.

Conclusion

Tae Ho Ham's contributions to substrate processing technology exemplify his commitment to innovation. His patent and ongoing work continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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