This inventor holds 1 USPTO granted patent. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Years Active: 2026
Title: Innovations by Tae Chul Shin in Water Measurement Technology.
Introduction
Tae Chul Shin is an innovative inventor based in Anyang-si, South Korea. He has made significant contributions to the field of water measurement technology. His work focuses on developing methods that enhance the accuracy and efficiency of water flow measurement and leak detection.
Latest Patents
One of Tae Chul Shin's notable patents is titled "Ultrasonic water meter flow measurement and outdoor water leak detection method using temperature distribution and pressure change." This invention provides a comprehensive method for measuring water flow and detecting outdoor water leaks. The process involves several key steps, including ultrasound time measurement, water flow rate calculation, and temperature distribution analysis. This innovative approach utilizes temperature changes and pressure variations to improve the reliability of water measurement systems.
Career Highlights
Throughout his career, Tae Chul Shin has demonstrated a commitment to advancing technology in water management. His patent reflects a deep understanding of both engineering principles and practical applications. This invention not only addresses current challenges in water measurement but also paves the way for future innovations in the field.
Collaborations
Tae Chul Shin has collaborated with talented individuals such as Kwang UK Jung and Ji Won Kim. Their combined expertise has contributed to the development of cutting-edge solutions in water measurement technology.
Conclusion
Tae Chul Shin's contributions to the field of water measurement technology exemplify the importance of innovation in addressing real-world challenges. His patented methods enhance the accuracy of water flow measurement and leak detection, showcasing the potential for future advancements in this critical area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile