Fuji, Japan

Tadayoshi Ishikawa

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadayoshi Ishikawa. Retrieved from https://idiyas.com/inventor/tadayoshi-ishikawa-5bbsqw7u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Tadayoshi Ishikawa: Innovator in Epoxy Resin Technology

Introduction

Tadayoshi Ishikawa is a notable inventor based in Fuji, Japan. He has made significant contributions to the field of epoxy resin technology. His innovative work has led to the development of a unique hardener for curable one-package epoxy resin systems.

Latest Patents

Ishikawa holds a patent for a hardener that enhances the performance of curable one-package epoxy resin systems. This master batch of hardener comprises a specific formulation that improves the curing process and overall effectiveness of the resin.

Career Highlights

Ishikawa is associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His work at the company has been instrumental in advancing epoxy resin applications. He has dedicated his career to researching and developing innovative solutions in this field.

Collaborations

Throughout his career, Ishikawa has collaborated with esteemed colleagues, including Hidekazu Ishimura and Masahiko Otsuka. These partnerships have fostered a creative environment that has led to groundbreaking advancements in epoxy resin technology.

Conclusion

Tadayoshi Ishikawa's contributions to the field of epoxy resin technology exemplify his dedication to innovation. His patent for a hardener for curable one-package epoxy resin systems showcases his expertise and commitment to advancing this important area of research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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