Tadasi Hattori

Title: Tadasi Hattori: Innovator in Diamond Film Synthesis

Introduction

Tadasi Hattori is a notable inventor based in Okazaki, Japan. He has made significant contributions to the field of materials science, particularly in the synthesis of diamond films. His innovative approach has led to advancements in the production of high-purity diamond films, which have various applications in technology and industry.

Latest Patents

Hattori holds a patent for an "Apparatus for forming diamond film." This invention describes an apparatus and process for synthesizing a diamond film of high purity at a high rate. The method involves introducing a mixture of hydrocarbon gas and hydrogen gas into an arc discharge to produce a gas plasma. This gas plasma is then directed against a substrate to deposit diamond. The invention is characterized by the placement of the substrate at a lower potential than a third electrode, which is connected to a plasma current power supply. This configuration allows for the efficient deposition of high-quality diamond films while minimizing the risk of overheating the substrate.

Career Highlights

Hattori's career has been marked by his work at Nippondenso Co., Ltd., where he has collaborated with other talented individuals in the field. His innovative contributions have not only advanced the technology of diamond film synthesis but have also positioned him as a key figure in materials research.

Collaborations

Throughout his career, Hattori has worked alongside notable colleagues such as Satoshi Nakamura and Minoru Yamamoto. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Tadasi Hattori's work in the synthesis of diamond films exemplifies the impact of innovation in materials science. His patented technology has the potential to revolutionize the production of high-purity diamond films, paving the way for new applications in various industries.