Company Filing History:
Years Active: 1998-2006
Title: The Innovations of Tadashi Sasaki
Introduction
Tadashi Sasaki is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 6 patents to his name, his work focuses on improving the efficiency and effectiveness of substrate treatment processes.
Latest Patents
One of his latest patents is a substrate processing apparatus designed for removing organic matter using a removal liquid. This innovative apparatus features an indexer part, a removal processing part, an interface, and a dry processing part arranged in a row. The removal processing part effectively removes organic matter by utilizing a removal liquid, which is positioned adjacent to the indexer part that loads and unloads substrates. The interface facilitates the transfer of substrates between the removal processing part and the dry processing part, ensuring that substrates are completely dried after the removal processing is completed.
Another notable patent by Sasaki is a substrate treating method and apparatus. In this design, a removal liquid supplying mechanism delivers a removal liquid to the substrate's surface. To retain the removal liquid for a specified duration, a spin chuck operates at a low speed, allowing the substrate to hold the liquid. This method enables the treatment to progress without the need for continuous supply, thereby minimizing the consumption of the removal liquid.
Career Highlights
Tadashi Sasaki is currently employed at Dainippon Screen Mfg. Co., Ltd., where he continues to innovate in substrate processing technologies. His work has significantly impacted the efficiency of substrate treatment in various applications.
Collaborations
Sasaki has collaborated with notable colleagues, including Masami Ohtani and Joichi Nishimura, contributing to advancements in their field.
Conclusion
Tadashi Sasaki's contributions to substrate processing technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work continues to influence the efficiency of substrate treatment processes, making a lasting impact in the field.
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