Company Filing History:
Years Active: 1987-1994
Title: Innovations by Tadashi Rokkaku
Introduction
Tadashi Rokkaku is a notable inventor based in Hiroshima, Japan. He has made significant contributions to the field of ion sources and sputtering apparatus, holding a total of five patents. His work has advanced the technology used in various applications, particularly in the semiconductor and materials science industries.
Latest Patents
Rokkaku's latest patents include a DC or HF ion source and a sputtering apparatus with an integrated ion source. The DC or high-frequency ion source features a hollow cathode and a hollow anode designed for applying a DC or alternating voltage. It includes a gas inlet for supplying discharge gas, a cathode heater, and a magnet to enhance plasma uniformity. The design allows for an elongated rectangular ion extraction outlet, which is crucial for controlling the energy of extracted ions. Additionally, the sputtering apparatus consists of two electrodes and a sputtering target, enabling the deposition of particles on a substrate through electric discharge.
Career Highlights
Rokkaku has built a distinguished career at Mitsubishi Jukogyo Kabushiki Kaisha, where he has been instrumental in developing innovative technologies. His expertise in ion sources and sputtering techniques has positioned him as a key figure in his field.
Collaborations
Throughout his career, Rokkaku has collaborated with notable colleagues, including Kenichi Yanagi and Mitsuo Kato. These partnerships have fostered a collaborative environment that has led to further advancements in their respective areas of expertise.
Conclusion
Tadashi Rokkaku's contributions to the field of ion sources and sputtering technology have made a lasting impact. His innovative patents and collaborative efforts continue to influence advancements in various industries.