Suwa, Japan

Tadashi Ohtsuka

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadashi Ohtsuka. Retrieved from https://idiyas.com/inventor/tadashi-ohtsuka-6mcjlv79

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tadashi Ohtsuka

Introduction

Tadashi Ohtsuka is a notable inventor based in Suwa, Japan. He has made significant contributions to the field of recording devices. His innovative work has led to the development of a unique patent that enhances recording technology.

Latest Patents

Tadashi Ohtsuka holds a patent for a "Recording device with connection means to first and second recording." This invention showcases his ability to integrate advanced technology into practical applications. The patent reflects his commitment to improving recording methods and devices.

Career Highlights

Ohtsuka is currently employed at Seiko Epson Corporation, a leading company in the technology sector. His role at the company allows him to work on cutting-edge projects that push the boundaries of innovation. His contributions have been instrumental in advancing the company's product offerings.

Collaborations

Throughout his career, Ohtsuka has collaborated with talented individuals such as Kazuhiko Koizumi and Tsutomu Nobutani. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Tadashi Ohtsuka's work exemplifies the spirit of innovation in the field of recording technology. His patent and contributions at Seiko Epson Corporation highlight his dedication to advancing technology. Ohtsuka's journey as an inventor continues to inspire future generations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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