Company Filing History:
Years Active: 2003
Title: The Innovations of Tadashi Fukumoto
Introduction
Tadashi Fukumoto is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device that enhances performance and efficiency.
Latest Patents
Fukumoto holds a patent for a semiconductor device with a varying width electrode. This invention involves the formation of an n-channel active region, a p-channel active region, and an isolation insulating film. A silicon film is deposited via a gate insulating film, and n-type impurities are introduced into the n-channel region while p-type impurities are introduced into the p-channel region. The silicon gate electrode is formed in such a manner that its width is enlarged only at the boundary between the n-channel and p-channel regions. After forming a side wall insulating film, an n-channel diffusion layer and a p-channel diffusion layer are created, followed by the formation of a metal silicide layer in a self-aligned manner on the surfaces of the silicon gate electrode, the n-channel diffusion layer, and the p-channel diffusion layer. This patent showcases Fukumoto's expertise in semiconductor design and innovation.
Career Highlights
Tadashi Fukumoto is associated with Matsushita Electric Industrial Co., Ltd., a company known for its advancements in electronics and technology. His work at Matsushita has allowed him to explore and develop cutting-edge semiconductor technologies. Fukumoto's contributions have been instrumental in enhancing the capabilities of semiconductor devices.
Collaborations
Fukumoto has collaborated with notable colleagues such as Masahiro Yasumi and Ichirou Matsuo. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Tadashi Fukumoto's contributions to semiconductor technology exemplify his innovative spirit and dedication to advancing the field. His patent for a semiconductor device with a varying width electrode highlights his expertise and commitment to improving electronic devices. Fukumoto's work continues to influence the industry and inspire future innovations.