Tokyo, Japan

Tadamitsu Kanekiyo

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):

Title: Tadamitsu Kanekiyo: Innovator in Plasma Processing Technology

Introduction

Tadamitsu Kanekiyo is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of plasma processing technology. His innovative work has led to advancements that are crucial in various industrial applications.

Latest Patents

Kanekiyo holds a patent for a plasma processing method and plasma ashing apparatus. This patent provides a method for selectively removing an amorphous carbon film containing boron after plasma etching. The process utilizes plasma generated from a mixed gas of oxygen and CHF gas, or just CHF gas, to effectively remove the amorphous carbon film from silicon nitride, silicon oxide, or tungsten films.

Career Highlights

Throughout his career, Tadamitsu Kanekiyo has been associated with Hitachi High-Tech Corporation. His work at this esteemed company has allowed him to explore and develop innovative technologies that enhance manufacturing processes. His expertise in plasma processing has made him a valuable asset in the field.

Collaborations

Kanekiyo has collaborated with notable colleagues, including Toru Ito and Masahito Mori. These partnerships have fostered an environment of innovation and have contributed to the success of various projects within the company.

Conclusion

Tadamitsu Kanekiyo's contributions to plasma processing technology exemplify the impact of innovation in modern manufacturing. His patent and collaborative efforts continue to influence the industry positively.

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