Osaka, Japan

Tadami Shimizu


Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 2001-2002

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2 patents (USPTO):Explore Patents

Title: Innovations by Tadami Shimizu in Semiconductor Technology

Introduction

Tadami Shimizu, an accomplished inventor based in Osaka, Japan, has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, his work focuses on methods for fabricating semiconductor devices that enhance device miniaturization and performance.

Latest Patents

Shimizu's latest patents include a groundbreaking semiconductor device that describes a multi-step fabrication process. The procedure begins with the formation of a gate insulating film, followed by a gate electrode and an on-gate protective layer on a silicon substrate. Lightly-doped source and drain regions are established, and first and second sidewalls are formed around the gate electrode. Heavily-doped source and drain regions are generated by implanting dopant ions using these sidewalls as masks. A critical aspect of his invention lies in the selective removal of the second sidewall before depositing an overall protective film, allowing for an unfilled gap between adjacent gate electrodes. This design minimizes the risk of short circuits between the gate electrode and contact members while contributing positively to device miniaturization.

Career Highlights

Throughout his career, Tadami Shimizu has worked with renowned companies such as Matsushita Electronics Corporation and Matsushita Electric Industrial Co., Ltd. His tenure at these companies has played a pivotal role in advancing semiconductor technologies, reinforcing his reputation as a leading inventor in the industry.

Collaborations

Shimizu has collaborated with other notable professionals in the field including Susumu Akamatsu and Toshitaka Hibi. These collaborations have fostered innovation and have significantly contributed to the successful development of semiconductor technologies.

Conclusion

Tadami Shimizu's innovative approaches to semiconductor device fabrication exemplify the importance of continuous research and development in technology. His work not only contributes to the advancement of semiconductor devices but also sets a foundation for future innovations in the field. As technology continues to evolve, inventors like Shimizu will remain at the forefront of shaping the future of electronics.

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