Hyogo, Japan

Tadaichi Shibahara

This inventor holds 1 USPTO granted patent. Top assignee: Sumitomo Seika Chemicals Co., Ltd.. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadaichi Shibahara. Retrieved from https://idiyas.com/inventor/tadaichi-shibahara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Tadaichi Shibahara: Innovator in Gas Treatment Technology

Introduction

Tadaichi Shibahara is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of gas treatment technology. His innovative methods focus on improving the efficiency and effectiveness of gas treatment processes.

Latest Patents

Shibahara holds a patent for a method titled "Method for treating gas and regenerating catalyst portion by portion." This method involves continuously treating a gas using an apparatus with a catalyst bed. The process includes passing a subject gas through the catalyst bed to adsorb substances and then using a regenerating gas to react and decompose these substances while regenerating the catalyst bed. This innovative approach allows for the efficient treatment of gases containing malodorous or harmful components.

Career Highlights

Tadaichi Shibahara is associated with Sumitomo Seika Chemicals Co., Ltd., where he applies his expertise in gas treatment technologies. His work has contributed to advancements in the industry, particularly in the development of methods that enhance the treatment of gases.

Collaborations

Shibahara has collaborated with notable colleagues, including Kanji Ueda and Yoshinori Takata. Their combined efforts have furthered research and development in gas treatment technologies.

Conclusion

Tadaichi Shibahara's innovative contributions to gas treatment technology demonstrate his commitment to improving industrial processes. His patent reflects a significant advancement in the field, showcasing the potential for more efficient and economical gas treatment solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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