Tadahiro Ishii

Title: Tadahiro Ishii: Innovator in Photosensitive Resin Technology

Introduction

Tadahiro Ishii is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of photosensitive resin compositions, particularly through his innovative patent that incorporates fullerene. His work has implications for the production of negative-type picture elements and devices using visible light.

Latest Patents

Ishii holds a patent for a photosensitive resin composition that includes a fullerene and a polymer compound capable of reacting with the fullerene when exposed to visible light. The patent outlines a method for forming negative-type picture elements, which involves creating a layer of the resin composition, irradiating it with visible light through a photo mask, and subsequently removing uncured portions to form a resist film. This method enables the production of devices with light in the visible range, showcasing the versatility and utility of his invention.

Career Highlights

Ishii is affiliated with the Institute of Physical and Chemical Research, where he has been able to apply his expertise in materials science and photochemistry. His work has not only advanced the understanding of photosensitive materials but has also paved the way for new applications in various technological fields.

Collaborations

Ishii has collaborated with notable colleagues such as Yusuke Tajima and Kazuo Takeuchi. These partnerships have likely contributed to the development and refinement of his innovative ideas and patents.

Conclusion

Tadahiro Ishii's contributions to the field of photosensitive resin technology highlight his role as a key innovator. His patent on fullerene-based compositions demonstrates the potential for advancements in device production using visible light.