Hiratsuka, Japan

Tadaaki Satoh

This inventor holds 1 USPTO granted patent. Top assignee: Kansai Paint Company, Ltd.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadaaki Satoh. Retrieved from https://idiyas.com/inventor/tadaaki-satoh-nbsej7ci

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1990

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tadaaki Satoh: Innovator in Printed Circuit Technology

Introduction

Tadaaki Satoh is a notable inventor based in Hiratsuka, Japan. He has made significant contributions to the field of printed circuit technology. His innovative approach has led to the development of a unique method for forming printed circuits.

Latest Patents

Tadaaki Satoh holds a patent for a method of forming a printed circuit and the printed circuit formed. This method utilizes a specified photo-curable coating composition. The composition is a photo-curable or ionizing radiation-curable powder coating that contains a thermoplastic resin in a solid state at normal temperature. It features 0.5 to 5 of a polymerizable unsaturated group per 1000 of number average molecular weight, serving as a film-forming component.

Career Highlights

Satoh is associated with Kansai Paint Company, Ltd., where he has been able to apply his expertise in developing advanced materials for printed circuits. His work has been instrumental in enhancing the efficiency and reliability of electronic components.

Collaborations

One of his notable collaborators is Tsutomu Maruyama, with whom he has worked closely on various projects related to printed circuit technology.

Conclusion

Tadaaki Satoh's contributions to the field of printed circuits exemplify the impact of innovative thinking in technology. His patent and ongoing work continue to influence advancements in electronic manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…