This inventor holds 1 USPTO granted patent. Top assignee: Massachusetts Institute of Technology. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: The Innovative Contributions of Taber H Smith
Introduction
Taber H Smith is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of plasma process analysis. His innovative techniques have advanced the understanding and monitoring of plasma processes, showcasing his expertise and dedication to research.
Latest Patents
Taber H Smith holds a patent for a "Monitor of plasma processes with multivariate statistical analysis." This patent involves monitoring the intensity of various radiation wavelengths emitted from a plasma process. The technique produces indications of P-dimensional correlations between these intensities as the process unfolds. By comparing these correlations with historical data, the status of the plasma process can be determined without relying on specific templates. This method allows for the discovery of complex correlations between radiation wavelengths, enabling a comprehensive evaluation of interactions across the entire spectrum of detected emissions.
Career Highlights
Smith's career is marked by his work at the Massachusetts Institute of Technology, where he has contributed to cutting-edge research in plasma processes. His innovative approach has led to advancements in the field, making him a respected figure among his peers. He has a total of 1 patent to his name, reflecting his commitment to innovation and research.
Collaborations
Some of his notable coworkers include Minh Le and Kuang Han Chen. Their collaborative efforts have further enhanced the research and development of plasma process analysis techniques.
Conclusion
Taber H Smith's contributions to plasma process analysis demonstrate his innovative spirit and dedication to advancing technology. His work continues to influence the field, paving the way for future advancements in plasma process monitoring.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
