T T Kodas

Title: T T Kodas: Innovator in Patterned Deposition Technologies

Introduction

T T Kodas is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of materials science, particularly in the area of patterned deposition on substrates. His innovative methods have implications for various applications, including electronics and materials engineering.

Latest Patents

Kodas holds a patent for "Methods for patterned deposition on a substrate." This patent describes a method for patterned depositions of a material onto a substrate. The process involves etching a surface of a polymeric substrate to create an etched layer with enhanced adhesion characteristics. Selected portions of this etched layer are then removed to define a pattern that exhibits both enhanced and diminished adhesion characteristics for the deposition of a conductor. In one embodiment, a PTFE substrate is chemically etched to improve copper adhesion, followed by laser irradiation to remove specific portions and form the desired patterns.

Career Highlights

Kodas is associated with Sandia Corporation, where he has been able to apply his expertise in materials science and engineering. His work has contributed to advancements in the field, particularly in the development of new methods for material deposition.

Collaborations

Some of his notable coworkers include Robert R Rye and Antonio J Ricco. Their collaborative efforts have likely enhanced the research and development initiatives at Sandia Corporation.

Conclusion

T T Kodas is a distinguished inventor whose work in patterned deposition technologies has paved the way for advancements in material applications. His innovative methods continue to influence the field and contribute to ongoing research and development efforts.