T K Leong, Deceased

Title: The Innovations of T K Leong

Introduction

T K Leong was a notable inventor whose contributions to the field of materials science have left a lasting impact. He was particularly recognized for his work in etching processes for silicides and polycrystalline silicon. His innovative approaches have been instrumental in advancing semiconductor technology.

Latest Patents

T K Leong held a patent titled "Materials and methods for etching silicides, polycrystalline silicon." This patent describes a gas chemistry and a related RIE mode process for etching silicides of refractory metals such as titanium, tantalum, tungsten, and aluminum. The process also includes etching composites of these silicides on polycrystalline silicon layers. Notably, BCl3 is added to the HCl/Cl2 gas chemistry used for the polysilicon etch, along with selected additives from fluorinated gases and oxygen. This innovation satisfies the multiple requirements of the two-step silicide-polysilicon etch process, including the silicide-to-polysilicon etch ratio requirement.

Career Highlights

Throughout his career, T K Leong worked at Applied Materials, Inc., where he made significant contributions to the field. His expertise in etching processes has been vital for the development of advanced semiconductor devices. His work has been recognized for its technical depth and practical applications in the industry.

Collaborations

T K Leong collaborated with several talented individuals during his career, including David N Wang and Mei Yin Chang. These collaborations helped to enhance the quality and impact of his work in the field of materials science.

Conclusion

T K Leong's innovative contributions to etching processes have played a crucial role in the advancement of semiconductor technology. His legacy continues to influence the field, and his work remains relevant to ongoing research and development efforts.