T E Felter

Title: T E Felter: Innovator in Extreme Ultraviolet Lithography

Introduction

T E Felter is a notable inventor based in Livermore, CA (US), recognized for his contributions to the field of lithography. He holds a total of 3 patents, showcasing his innovative approach to technology and engineering.

Latest Patents

Among his latest patents is a groundbreaking method for extreme ultraviolet lithography. This method involves producing a patterned array of features, particularly gate apertures, in the size range of 0.4-0.05 µm using projection lithography and extreme ultraviolet (EUV) radiation. A high-energy laser beam is utilized to vaporize a target material, creating a plasma that generates extreme ultraviolet radiation with a characteristic wavelength of about 13 nm for lithographic applications. The radiation is then transmitted through a series of reflective mirrors to a mask that contains the pattern to be printed. The demagnified focused mask pattern is subsequently transmitted through appropriate optics in a single exposure to a substrate coated with photoresists designed to be transparent to EUV radiation, while also satisfying conventional processing methods.

Career Highlights

T E Felter has had a distinguished career, working with prominent organizations such as Sandia Corporation. His work has significantly advanced the field of lithography, particularly in the development of methods that enhance the precision and efficiency of semiconductor manufacturing.

Collaborations

Throughout his career, T E Felter has collaborated with notable individuals, including Glenn D Kubiak and G D Kubiak. These collaborations have contributed to the innovative advancements in his field.

Conclusion

T E Felter's contributions to extreme ultraviolet lithography exemplify his commitment to innovation and excellence in technology. His patents and career achievements reflect a deep understanding of the complexities involved in modern lithographic processes.