This inventor holds 1 USPTO granted patent and 1 published patent application and 3 EPO patents. Top assignee: Intertechnique. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Séverine Aubonnet: Innovator in Mask Regulator Technology
Introduction
Séverine Aubonnet is a notable inventor based in Viroflay, France. He has made significant contributions to the field of respiratory technology, particularly with his innovative designs in mask regulators. His work has implications for both medical and aeronautical applications.
Latest Patents
Aubonnet holds a patent for a "Demand and dilution mask regulator and method of regulating additional oxygen in the mask regulator." This invention features a demand and dilution mask regulator that includes an oxygen feed circuit and a dilution circuit for supplying air. The design incorporates a mixing chamber where the two circuits converge. The dilution circuit measures the inhaled breathe-in air flow rate through a capillary duct connected to a Venturi construction. The method of regulating the flow rate of additional oxygen utilizes flow rate data from the capillary duct to control the oxygen flow rate supplied to the mixing chamber. He has 1 patent to his name.
Career Highlights
Throughout his career, Séverine Aubonnet has worked with prominent companies in the aerospace and technology sectors. Notably, he has been associated with Intertechnique and Safran Aerotechnics, where he contributed to advancements in aeronautical engineering and respiratory devices.
Collaborations
Aubonnet has collaborated with several professionals in his field, including Didier Lamourette and Patrick Maire. These partnerships have fostered innovation and development in the technologies he has worked on.
Conclusion
Séverine Aubonnet's contributions to mask regulator technology highlight his role as an innovator in the field. His patent and collaborations reflect a commitment to advancing respiratory technology for various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile