Osny, France

Sébastien Douche

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Idemia Identity & Security France. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sébastien Douche. Retrieved from https://idiyas.com/inventor/sébastien-douche

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sébastien Douche

Introduction

Sébastien Douche is an accomplished inventor based in Osny, France. He has made significant contributions to the field of biometric technology. His innovative work focuses on enhancing the security and efficiency of biometric data acquisition.

Latest Patents

Sébastien Douche holds a patent for a system designed to acquire a biometric print using a smartcard. The patent describes a system comprising a card and a peripheral device that work together to enable the acquisition of a biometric print. The smartcard includes a biometric print sensor and a control module that transmits control signals to the peripheral device. Each control signal is defined by a respective single level of an electrical characteristic. The peripheral device may include only passive components, including a user interface that guides the user in acquiring a biometric print.

Career Highlights

Sébastien Douche is currently employed at Idemia Identity & Security France, a company known for its advancements in identity solutions. His work at Idemia has allowed him to focus on innovative technologies that enhance security measures in various applications.

Collaborations

Sébastien has collaborated with notable colleagues, including Nicolas Prawitz and Olivier Latrille. Their teamwork has contributed to the development of cutting-edge biometric solutions.

Conclusion

Sébastien Douche's contributions to biometric technology exemplify the importance of innovation in enhancing security measures. His patent and work at Idemia Identity & Security France highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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