Antony, France

Sébastien Baey

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Centre National De La Recherche Scientifique, Tagsys, Université Amiens Picardie Jules Verne. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sébastien Baey. Retrieved from https://idiyas.com/inventor/sébastien-baey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Sébastien Baey: Innovator in RFID Technology

Introduction

Sébastien Baey is a notable inventor based in Antony, France. He has made significant contributions to the field of RFID technology, particularly in the area of distinguishing between moving and stationary RFID tags. His innovative approach has implications for various industries, including merchandise tracking.

Latest Patents

Sébastien Baey holds a patent for a "Method of discriminating RFID tags in motion from static RFID tags." This patent outlines a system that allows for the effective differentiation of moving tags from stationary ones. Such technology is crucial for enhancing the efficiency of tracking systems that utilize RFID tags.

Career Highlights

Throughout his career, Sébastien has worked with prominent organizations, including Tagsys and Université Pierre et Marie Curie (Paris 6). His experience in these institutions has allowed him to refine his skills and contribute to advancements in RFID technology.

Collaborations

Sébastien has collaborated with notable colleagues such as Christophe Loussert and Brigitte Kervella. These partnerships have fostered a creative environment that has led to innovative solutions in the field.

Conclusion

Sébastien Baey's work in RFID technology exemplifies the impact of innovation on modern tracking systems. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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